Abstract

A facile and efficient method using high energy ball milling (HEBM) to produce surfaces with a static and advancing contact angle in the superhydrophobic regime consisting of alkyl-passivated crystalline silicon particles is described. Deposition of the functionalized silicon material forms stable films on a variety of surfaces due to strong hydrophobic interactions between the individual particles. The process offers the ability to control the particle size from a micro-scale to a nano-scale region and thus to tune the surface roughness. Because of changing surface morphology and the decreasing surface roughness of the films due to the increasing milling times the static and dynamic contact angles follow a polynomial function with a maximum dynamic advancing contact angle of 171°. This trend is correlated to the commonly used Wenzel and Cassie-Baxter models.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.