Abstract
Infrared absorption measurements have been made of physically adsorbed water and silanol in pure silicate, borosilicate, phosphosilicate and arsenosilicate glass films. These films were chemically vapor-deposited in the temperature range of from 350 to 500°C and then exposed to moist air at room temperature. The adsorbed amount of water increases with time up to about 105 minutes for pure silicate and borosilicate and 103–104 minutes for phosphosilicate glass films, and then decreases. This suggests that the internal surface area available for adsorption decreases with time. On the other hand, water adsorption is scarcely observed for arsenosilicate glass films prepared by TEOS-AsCl3-O2 gas system and these films have great advantage for surface passivation. The adsorbed amount of water is strongly related to the water contact angle and the Si-O band position of glass. With higher water contact angle and wave number of Si-O band position near 9 µm, the adsorbed amount of water decreases.
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