Abstract

A series of technological steps concentrating around photolithography and UV polymer on glass replication in a mask-aligner that allow for the cost-effective generation of rather complex micro-optical systems on the wafer level are discussed. In this approach, optical functional surfaces are aligned to each other and stacked on top of each other at a desired axial distance. They can consist of lenses, achromatic doublets, regular or chirped lens arrays, diffractive elements, apertures, filter structures, reflecting layers, polarizers, etc. The suitability of the separated modules in certain imaging and non-imaging applications will be shown.

Highlights

  • Discussed extensively in recent years, wafer level optics is a well-established technology, which had been introduced decades ago in the field of miniaturized or micro-structured optics

  • In the present paper we present a refined wafer-level fabrication technology involving UV polymer molding, coating and lithography which is based on earlier work [2] but is characterized by a much higher degree of variety and complexity

  • We found that long-term radius changes of the ORMOCOMP® polymer lenses after hard bake were well below 1%

Read more

Summary

Introduction

Discussed extensively in recent years, wafer level optics is a well-established technology, which had been introduced decades ago in the field of miniaturized or micro-structured optics. More than ten years ago, UV polymer on glass replication [1] using a modified mask aligner as a lithography related fabrication tool was introduced as a precise and cost effective technology for the generation of wafer-scale miniaturized optical systems and for hybrid integration [2]. Our focus is on the interaction and compatibility of process steps in order to generate systems with high lateral and axial complexity. This will be illustrated in the subsequent chapter ―Experimental examples and characterization‖ by discussing special aspects of three different micro-optical systems. A summary of typical systems, their performance and main technological parameters will be given and conclusions will be drawn

UV Polymer Molding
Coating and Structuring
Compatibility
Thermal Behavior
Mastering by Photolithography
Options and Add-ons
Lens Arrays on Si Detector Arrays
LED Spot Array Illumination
Multi-Aperture Cameras and Channel Isolation
Findings
Summary and Conclusions
Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.