Abstract
<p class="1Body">The change of plasma conditions caused by pressure increasing can affect the change of electrical characteristic of plasma and influence in each of plasma process is done, its change can be estimated by means of voltage-current characteristics from V-I measurement and simulation of the plasma equivalent circuit model. This study is investigation of electrical characteristic of 40 kHz Capacitive Coupled Plasma (CCP) from V-I measurement were combined by simulation of the plasma circuit model, the goal study is observation of the change of electrical properties of plasma in different pressure conditions. The simulation results show that the output of circuit model in the simulation are similar with voltage-current characteristic from V-I measurement in 300 mTorr-900 mTorr pressure conditions. From the characterization, can be concluded that the electrical properties of CCP can be estimated by using the resistor and capacitor values of circuit model in the simulation to get similarity characteristic with voltage-current from V-I measurement.</p>
Highlights
To obtain the succesful operation of plasma is required equilibrium condition, which is said to be stabilized or controlled (Harry, 2010)
The change of plasma conditions caused by pressure increasing can affect the change of electrical characteristic of plasma and influence in each of plasma process is done, its change can be estimated by means of voltage-current characteristics from V-I measurement and simulation of the plasma equivalent circuit model
This study is investigation of electrical characteristic of 40 kHz Capacitive Coupled Plasma (CCP) from V-I measurement were combined by simulation of the plasma circuit model, the goal study is observation of the change of electrical properties of plasma in different pressure conditions
Summary
To obtain the succesful operation of plasma is required equilibrium condition, which is said to be stabilized or controlled (Harry, 2010). The change of plasma conditions have to be observed to reach optimum value from our plasma system and the successful operation in each of plasma process. This observation can be done by the way characterization process of electrical properties of plasma based on electric measurement. After characterization process we will get a character which can be represented into electrical model and it can be used to determine stability parameters. An electrical models of plasma can be developed by experimental or numerical approximation, it has been used to predict transitions from different power-pressure regimes or the influence of different attaching gases on plasma impedance (Scanlan, 1991)
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