Abstract
Very thin N-doped nanostructured carbon films were deposited on quartz and sapphire substrate by radio-frequency reactive magnetron sputtering using carbon target and gas mixture of Ar and N2 or N2+H2 reactive gasses. Rutherford backscattering spectroscopy and Elastic recoil detection analytical methods determined the concentration of elements in the films. Scanning electron microscopy was used to investigate the surface morphology of nanostructured very thin carbon films. Raman spectroscopy was used for the determination of chemical structural properties of the thin nanostructured carbon films. Pulsed laser induced electron emission method was used for the study of photoelectron emission properties of nanostructured carbon films. Measured bunch charge results of fabricated transmission photocathodes showed better photoelectron emission properties of very thin nanostructured carbon films prepared on sapphire substrates. Effects of substrate and technology of very thin nanostructured carbon films on the properties of photo-induced electron emitters as backside illuminated transmission photocathode are discussed.
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