Abstract
To realize graphene-channel field-effect-transistors (GFETs) with unipolar behavior and high on/off current ratios, we fabricated and characterized top-gate GFETs with n-type doped SiC (n-SiC) source/drain (S/D) regions on 4H-SiC(0001) substrates. 0–2 mono-layers (MLs) of graphene were grown on a monoatomic interfacial layer called zero-layer (ZL) by vacuum annealing. The 0–2 graphene MLs on the ZL were converted into 1–3 MLs of graphene without a ZL by annealing in H2. The GFETs with n-SiC S/D regions and 1–3 MLs of graphene without a ZL showed unipolar behavior with a high on/off current ratio of 2.7 × 103.
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