Abstract
Stationary phase morphology and surface chemistry dictate the properties of ultrathin-layer chromatography (UTLC) media and interactions with analytes in sample mixtures. In this paper, we combined two powerful thin film deposition techniques to create composite chromatography nanomaterials. Glancing angle deposition (GLAD) produces high surface area columnar microstructures with aligned macropores well-suited for UTLC. Atomic layer deposition (ALD) enables precise fabrication of conformal, nanometer-scale coatings that can tune surfaces of these UTLC films. We coated ∼5μm thick GLAD SiO2 UTLC media with <10nm thick ALD metal oxides (Al2O3, ZrO2, and ZnO) to decouple surface chemistry from the underlying GLAD scaffold microstructure. The effects of ALD coatings on GLAD UTLC media were investigated using transmission electron microscopy (TEM), gas adsorption porosimetry, and lipophilic dye separations. The results collectively show that the most significant changes occur over the first few nanometers of ALD coating. They further demonstrate independent control of film microstructure and surface characteristics. ALD coatings can enhance complex GLAD microstructures to engineer new composite nanomaterials potentially useful in analytical chromatography.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
