Abstract
Details from the design, installation, and certification of a novel, zero deadspace, continuous flow, facility gas distribution and monitoring system, and its initial commissioning results are presented. The system as described has been implemented on the N/sub 2/, O/sub 2/, He, and Ar supply lines at Digital Semiconductor's Fab 6 in Hudson, MA. Ultra-high purity (UHP) gases supplied via these systems have demonstrated guaranteed performance specifications of <1 part-per-billion (ppb), for individual contaminants, to the tool hook-up point-of-connect (POC). Digital Semiconductor adopted this design to supply ultra-high purity gases to processing equipment in support of three successive generations of sub 0.5 /spl mu/m ULSI semiconductor development and production. Proposed advantages of the design include reduced contaminant accumulation and intrusion with improved purgability, maintainability, and upset monitoring. Results presented detail system start-up and baselining, including data at tool hook-up POC.
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