Abstract
ABSTRACTWe demonstrate a novel technique to study in detail the picosecond dynamics of semiconductors close to the melting phase transition. A variable-energy IR pulse (1.06 μm) is used to melt Si or GaAs samples via free carrierabsorption (FCA) in the dense and hot electron-hole plasma (EHP) produced by a preceding visible (532 nm) pulse. By varying the delay between the pulses and their relative intensities, we are able to verify the Lietoila-Gibbons model for pulsed laser heating, and to measure in detail important parameters of the EHP over a wide range of experimental conditions.
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