Abstract
We demonstrate a novel approach for the easy fabrication of photonic crystals (PCs) with arbitrary optical lattice using two-photon holographic lithography (HL). The quadratic dependence of the two-photon absorption process dramatically increases the contrast of the pattern and the low absorption coefficient of the photoresist at 720 nm lead to a high aspect ratio and low fluctuation of the pattern. By applying such a technique, defect-free and highly uniform one-dimensional gratings, two-dimensional quasicrystals, and three-dimensional (3D) face center cube-type PCs of high aspect ratio and small filling factor are obtained. This two-photon based HL technique is particularly suitable for making 3D PCs and quasicrystals with complex and fine structural details.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
