Abstract
For the first time, two dimensional contrast micrographs representing both the amplitude and phase of microwave voltages inside a monolithic integrated interdigital capacitor were measured by a high frequency scanning force microscope (HFSFM) test system up to 10 GHz. The comparison of this micrographs with the topography, measured by the same test system, using the topographic imaging mode, allows the investigation of voltage distributions within monolithic microwave integrated circuits (MMIC), for the purpose of function and failure analysis. Furthermore point measurements up to 20 GHz in the frequency domain at the input and the output of the MMIC allows the determination of the transmission characteristic of the tested device. With this measurements a voltage resolution of 3 mV and a spatial resolution of 160 nm can be achieved.
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