Tunneling phenomenon of amorphous indium-gallium-zinc-oxide thin film transistors for flexible display

Abstract

It is an importance to understand the contact mechanism at interfaces between dielectric and channel materials to improve the performance of thin film transistors. Oxide semiconductor has proposed as promising candidate for transparent flexible application, whose development requires greater understand and control of their electron contacts. The performance of IGZO/SiOC TFTs depended on properties of SiOC as a gate insulator. SiOC exhibited a range of systematic interface electronic structure that can be understood at the atomic scale to provide a comprehensive feature of Schottky barrier and Ohmic contacts. The conduction of TFTs prepared on low polar SiOC was progressed by the tunneling behavior. The ambipolar transfer characteristics in tunneling transistors were done by a spontaneous potential barrier of SiOC such as the Schottky barrier (SB) in a short range and Ohmic contact in a long range. TFTs on SiOC with Poole-Frenkel contact as high SB operated under the threshold voltage, and then became free from the threshold voltage shift. However, the TFTs on high polar SiOC with Ohmic contact in a short range was also showed the unipolar characteristics by the trapping behavior as well as instability owing to the operation at high drain bias voltage over the threshold voltage.