Trimethylsilane-based pretreatments in a Mg-rich primer corrosion prevention system

Abstract

A trimethylsilane-based coating was investigated as a pretreatment for Al-2024 T3 in a novel Mg-rich primer corrosion prevention system. SiC-based thin films were deposited onto Al substrates by plasma-enhanced chemical vapor deposition (PECVD). A screening study of the pressure ( P) dependence of films deposited at 350 °C showed an increase in growth rate from 0.6 to 1.9 Torr. A second screening study where P was fixed at 1.9 Torr and temperature ( T) was varied from 125 to 550 °C showed decreasing growth rates with increasing temperature with an apparent transition around 300 °C. Electrochemical impedance spectroscopy (EIS) of the SiC-based films on Al-2024 after exposure to a corrosive environment (i.e., dilute Harrison solution) indicated that samples coated using SiC-based films exhibit higher low frequency impedance (i.e., 100–1000× higher) than bare Al-2024 with open circuit potential remaining 0.1 V higher for the former suggesting the SiC-based films slow the corrosion process. A Mg-rich primer was coated onto the SiC on Al-2024 with the galvanic function of the system determined by EIS. As compared to SiC on Al-2024, a similar behavior for the low frequency impedance was observed for the Mg-rich primer-coated samples with some films exhibiting 1E + 8 Ω at 0.1 Hz indicating a strong barrier property. Initial gas jet erosion using acrylic media indicates the Mg-rich primer coatings are removed in preference to the Si–C films—the first step toward demonstrating a permanent pretreatment. When successfully developed and optimized, the value of such a hard, protective coating is the reduction of a three-component coatings system (i.e., pretreatment, primer, and topcoat) to a two-component system (i.e., primer and topcoat).