Abstract
Bandtail defect carrier trapping dynamics in high quality photo-CVD grown a-Si1-xGex:H (x=0.3 and 0.62) and PECVD deposited a-Si:H films were studied using photo-modulated electron spin resonance (PMESR). Comparison of the dark spin densities with junction capacitance (drive-level profiling) methods indicate that a majority of the defects are neutral in the a-Si:H and 30% Ge samples, but the majority of the defects in the 62% Ge sample are charged. Lineshape deconvolution of the PMESR signals in the in-phase and quadrature phase as a function of photo-modulation frequency, excitation energy and excitation intensity for both intrinsic (state A) and light soaked (state B) states revealed three significant insights: in state A all samples behave similarly, state B behavior of the a-Si:H is dramatically different from the state B alloyed samples, and strong evidence for 'safe hole traps' (SHT) is observed in the state B a-Si:H material.
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