Abstract
Laser-induced fluorescence spectroscopy using a cw ring dye laser was applied to the detection of low-density SiH2 in a low-power RF SiH4/Ar mixture plasma at 40 mTorr. The translational temperature of SiH2 in the plasma was determined from the excitation line profile and was found to be near room temperature irrespective of the SiH4 mixing ratio.
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