Abstract
This study presents the technological process for producing a lenticular array on quartz. With scanning immersion lithography used to define the 3D lenticular array structure on a quartz substrate, inductively coupled plasma-reactive ion etching (ICP-RIE) is able to directly etch the structure. Based on the surface measurement, ICP-RIE can completely etch the surface structure onto the quartz substrate, and the surface roughness can reach 30 nm. Furthermore, after the optical measurement of stereoscopic images, the left and the right stereoscopic images can be successfully transmitted to the corresponding places without crosstalk and with a splitting efficiency close to 80%. As a result, this technology allows for the production of a lenticular structure with various changes on the quartz surface.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
