Abstract
An effective approach is described for the synthesis of binary patterned polymer brushes using a combination of capillary force lithography and surface-initiated polymerization. First, the approach calls for an ultrathin polystyrene (PS) mask to be deposited, in a pattern, over a surface to which a layer of polymerization initiator has already been anchored. Next, surface-initiated atom transfer radical polymerization (ATRP) is performed. This can graft the initial polymer brush onto those areas of the surface unprotected by the PS mask. After grafting is complete, the PS mask is removed and a second brush is synthesized on the newly exposed areas.
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