Abstract
Thin films were deposited using a vacuum arc with a refractory anode. The arc was sustained between a water cooled Zr cathode and a graphite anode. Both electrodes with diameter 32 mm and 30 mm length, with a gap of 10 mm between them. The distance from the arc axis to the substrate was 110 mm. The arc was operated either 40 or 60 s before a glass substrate was exposed to the plasma for 15 s. The film thickness was measured by profilometry. The deposition rate was obtained from the film thickness and exposition time. The visual radiation emitted by the plasma plume was photographed with a digital camera. The highest measured deposition rate was 0.71 μm/min, for an arc current of 225 A and time before exposure of 60 s.
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