Abstract
The appearance of the RT/Duroid/sup /spl reg// without copper is not suitable for manufacturing thin film resistor and conductor due to the tissue of the material. Changing the appearance is necessary for thin film purposes. The thin film resistor and conductor are realized on the changed Duroid material by sputtering, photolithography and etching technologies. The properties of the integrated resistors are discussed in detail in this paper. The method is useful to miniaturize and integrate the microwave products.
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