Abstract
The thin-film limit is derived by a nonconventional approach and equations for transmittance, reflectance and absorptance are presented in highly versatile and accurate form. In the thin-film limit the optical properties do not depend on the absorption coefficient, thickness and refractive index individually, but only on their product. We show that this formalism is applicable to the problem of ultrathin defective layer e.g. on a top of a layer of amorphous silicon. We develop a new method of direct evaluation of the surface defective layer and the bulk defects. Applying this method to amorphous silicon on glass, we show that the surface defective layer differs from bulk amorphous silicon in terms of light soaking.
Highlights
The so-called thin-film limit (TFL) or thin-film approximation is consistent with the concept of effective thickness that does not distinguish between thickness and absorption coefficient [1]
We show that this formalism is applicable to the problem of ultrathin defective layer e.g. on a top of a layer of amorphous silicon
We develop a new method of direct evaluation of the surface defective layer and the bulk defects
Summary
The so-called thin-film limit (TFL) or thin-film approximation is consistent with the concept of effective thickness that does not distinguish between thickness and absorption coefficient [1]. If the layer is parameterized by its absorption coefficient α, thickness d and refractive index n, the measurable optical properties A, R and T do not – in the FTL – depend on the parameters α, d or n individually, but only on their product αdn. Neither do they depend directly on the wavelength. Under conditions of the TFL the defective layer can be parameterized only by only one “effective product” comprising of the product of its (virtual) thickness, refractive index and absorption coefficient. The surface and bulk defects can be calculated directly without fitting
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