Abstract
Energy minimization considerations are used to estimate the strain tensor for pseudomorphic structures grown on a patterned substrate. We show that if a material B is deposited below critical thickness in a hole of width W in a substrate A the strain is biaxial unless W ≤ 50 Å, when the strain becomes hydrostatic. For W > 50 Å if the material A is deposited on top of the layer B, as the thickness of A is increased, the lattice matched overlayer A gradually readjusts the strain causing the strain in region B to change from biaxial to hydrostatic. For reasonable film thickness we find that hydrostatic strain can be produced for patterns with widths up to 0.3μm. Since the bandgap changes considerably when the strain changes from biaxial to hydrostatic, this concept can be used to produce lateral variation in the bandgap of heterostructures in single step epitaxy.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.