Abstract
The possibility of the transfer of a holographic structure that was originally registered on layers of dichromated gelatin (DCG) onto a substrate material of polymethylmethacrylate (PMMA) has been shown. The use of a selective destructive effect of short-wave UV radiation with a wavelength that is less than 270 nm is the basis of the mechanism of formation of secondary relief-phase holographic structure on the surface of PMMA. The optimization of processing modes and selection of developing compositions which are based on isopropanol and methylisobutylketone (MIBK) have been carried out, which made it possible to create reliefphase holographic gratings with high diffraction efficiency (DE) of about 25% and the maximum depth of the surface relief of the order of 1 μm on the substrates of PMMA.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
