Abstract
Carbon tetrachloride dissociatively adsorbs on the Ga-rich (4×2) reconstruction of GaAs (001) at 200 °C. Upon heating to 440 °C, the chlorine desorbs as GaCl, which etches the surface. Scanning tunneling micrographs reveal that this reaction transforms the (4×2) into a Ga-rich (3×2) structure that is interlaced with As-rich (2×4) phases. The (3×2) is well ordered, while the (2×4) phases exhibit a high degree of disorder. This work establishes the surface reaction pathway for carbon doping of GaAs with CCl4.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
