Abstract
The pumping characteristics of the suspension-type turbomolecular pump with a high flow rate, which is operable within a pressure range of 102 Pa or below required for the semiconductor production system (physical vapor deposition, chemical vapor deposition, etc.), are described below. Conventional turbomolecular pumps are available with the operation pressure only up to a molecular flow range of 10−8 to 10−1 Pa. After trial manufacture of various rotor profiles, the rotor which would make the pump operable up to a transition flow range of 102 Pa was reviewed in this experiment. As a result of the experiment, a rotor which could achieve a flow rate of 2900 standard cm3/min (sccm) (6×102 Pa) at a pumping speed of 600 1/s (N2: 10−1 Pa or less) could be obtained. It was also found that the flow rate characteristics differed according to the rotor profile and working pressure range. Also reviewed in this paper is the surface treatment method for protection of the rotor (Al alloy) from reactive gases (Cl, F, and Ga) used in the semiconductor production systems.
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