The preparation of X-ETS-4 by ion-exchanged method and adsorption performance of C3F8/N2

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Octafluoropropane (C 3 F 8 ) is widely used as etching agent in refrigeration, air conditioning and semiconductor industries. However, due to its long lifespan and strong infrared absorbing ability, once C 3 F 8 is emitted, the atmospheric radiation absorbing ability will be permanently altered, which will result in a serious greenhouse effect. Therefore, the efficient removal technology of C 3 F 8 is crucial in protecting the environment and alleviating the greenhouse effect. In this work, a series of X-ETS-4 (X: Mg, Ca, Sr, Ba) molecular sieves were synthesized by solvothermal and ion-exchange method. The morphology and structure of the prepared X-ETS-4 were characterized by FT-IR, XRD, and SEM, etc. The adsorption performance of the X-ETS-4 on C 3 F 8 are determined by fixed-bed adsorption breakthrough experiments and single-component isothermal adsorption experiments. The adsorption mechanism was investigated using different adsorption theoretical models. The results show that Ba-ETS-4 exhibits high adsorption capacity and high adsorption selectivity for C 3 F 8 , achieving C 3 F 8 adsorption separation at very low concentration (C 3 F 8 /N 2 volume ratio = 1:400). The saturated adsorption capacity of Ba-ETS-4 on C 3 F 8 reaches 155.17 mg/g (298 K, 170 kPa), which is 15.49 times more than that of Na-ETS-4. In addition, the ideal adsorption solution theory (IAST) separation selectivity of C 3 F 8 /N 2 reaches 341–941 in the pressure range of 0–170 kPa.

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