Abstract

AbstractThe structure and chemistry of interfaces and grain boundaries are known to influence the optical and electrical properties of wide-band gap semiconductors structures. ZnO/AlN/Si(100) heterostructures grown by laser deposition were studied by conventional and high-resolution transmission electron microscopy (HRTEM). The local electronic structure of ZnO grain boundaries was investigated by high resolution Z-contrast imaging using scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy in a scanning mode. Zcontrast imaging and EELS were performed simultaneously enabling direct correlations between interface chemistry and local structure to be made. ZnO grain boundaries are composed of a periodic array of a basic structural unit. On the basis of the electron energy-loss near-edge structure (ELNES) of zinc and oxygen edges associated with the ZnO- grain boundaries, the corresponding electronic spectrum was discussed.

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