Abstract
We have observed the initial oxidation stages of Cu(001) thin films by in situ ultrahigh vacuum‐transmission electron microscopy, examining the role of surface defects, such as surface steps, as possible nucleation sites for the on Cu(001) due to oxidation. Weak beam techniques were used to image surface steps. In contrast to previous speculations, we did not observe evidence that surface steps are preferential nucleation sites. © 1999 The Electrochemical Society. All rights reserved.
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