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The Influence of Cleaning Parameters in High-Density Argon Plasma on the Surface Morphology of Glass Substrates and the Characteristics of the Emission Spectrum

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The influence of cleaning parameters in high-density inductively coupled argon plasma on the surface morphology of glass substrates and the characteristics of their optical emission spectrum was studied. Cleaning was performed with RF source power ranging from 100 to 2000 W and durations of up to 150 s. Surface morphology was analyzed using atomic force microscopy, and plasma diagnostics were provided by optical emission spectroscopy. It was established that cleaning parameters at a discharge power of 300 W and duration of 60 s ensure minimal surface roughness and contaminant removal without surface damage. Spectral analysis revealed an increase in the intensity of argon atomic lines with increasing power and gas flow rate, reflecting an increase in excited particle density and electron temperature. The obtained dependencies can be used for automated monitoring and adjustment of plasma cleaning regimes in technological processes.

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Photoemission‐assisted plasma irradiation of a 2″ Cu substrate was performed to clarify the effect of ion impingement on the substrate. With the use of a photoemission‐assisted plasma apparatus, the photoemission‐assisted plasma was evaluated by optical emission spectroscopy and discharge characteristics. The density ratio of Ar ions and atoms increases with increasing the bias voltage of photoemission‐assisted plasma. Changes in the surface morphology of the substrate were investigated using atomic force microscopy. Sufficient ion density can be obtained in photoemission‐assisted Townsend discharge, and surface roughness of the Cu substrate decreased as the plasma irradiation time increased. This result indicates that ion impingement from photoemission‐assisted Townsend plasma can sputter the metal surfaces, leading to a decrease in surface roughness. Copyright © 2011 John Wiley & Sons, Ltd.

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Influence of Applied Discharge Voltage and Gas Flow Rate on Nickel Plasma Jet Parameters Diagnosed by Optical Emission Spectroscopic Technique
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Abstract: In this work, we measure the plasma parameters by using an AC high-voltage power supply that generates a non-thermal plasma jet system at atmospheric pressure. A nickel (Ni) metal strip, with dimensions of 1.5 × 10 cm2, was connected to the anode electrode of the AC power supply. This nickel strip was immersed in a flask with a small amount of distilled water positioned below the plasma plume nozzle. Optical emission spectroscopy (OES) was used to diagnose the plasma system at different argon gas flow rates (1-5 L/min) and varying applied voltage values (11-15 kV). It is significant to know the processes accompanying plasma generation to measure their parameters which include the electron temperature (Te), electron number density (ne) of the plasma, Debye length (λD), and plasma frequency (fp). Our results showed an increase in the intensity of spectral lines with the increase in applied discharge voltage (11-15 kV). The maximum peak for ArI was observed at a wavelength of 811.531 nm, and the maximum peaks for nickel (Ni) were observed at wavelengths of 285.21 and 519.70 nm. Also, the results indicated a gradual increase in electron temperature (Te) and electron density (ne) values at the applied voltage of 0.403-0.468 eV. Likewise, the electron density (ne) was in the range of (11.486-13.851) × 1017 cm-3. Keywords: Atmospheric plasma jet, Nickel (Ni) plasma parameters, Electron temperature, Spectroscopic optical emission (OES).

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A Penning ion source with self-heated cathodes has been applied in a miniature cyclotron. Optimizing the formation of negative hydrogen ions in the ion source needs the knowledge of plasma parameters. Optical emission spectroscopy is introduced as a noninvasive and in situ diagnostic tool for line-of-sight averaged plasma parameters in this paper. The relative intensities of neutral atomic hydrogen emission spectral lines are used to evaluate the electron temperature of hydrogen plasma. The experimental results show that the relative intensities of Balmer lines (H <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">α</sub> , H <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">β</sub> , and H <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">γ</sub> ) display significant dependence on gas flow rate, not sensible to arc current and magnetic field. The calculated electron temperature is in the range of 4000-7000 K in the experiments. The correlations of electron temperature with arc current, gas flow rate, and magnetic field are discussed, respectively.

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