Abstract
Sputtered molybdenum disulfide films having various density, internal stress, morphology, and impurities were produced by varying argon pressure, and the properties were investigated. The main results obtained are summarized as follows : A decrease of argon pressure brings the increase of the bulk density, compressive stress, and argon contents in films. However, the weight of films and stoichiometry are scarcely influenced by the argon pressure. The decrease of bulk density correlates with the proportion of voids in films. An increase of argon pressure brings the increase of the deposition rate, true density, and oxygen contents in films. The occurrence of compressive stresses and increase of true density correlate with the presence of entrapped argon in films. At least in the argon pressure range of 1.7 to 4 Pa, films with preferential orientation were obtained.
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