Abstract
The electrical and plasma properties of a large-area inductiveplasma source are investigated. The source is a 71 cm × 61 cm × 20 cm metal chamber providing a processing area of 37 cm × 47 cm for large-size wafers and glass substrates for flat paneldisplays. The exciting antenna is embedded inside the processing chamber, andthe rf power is inductively coupled from the antenna to the plasma throughthin (1.7 mm thick) quartz tubes. A tuning network is used to launch atravelling wave or a wave with a desired standing-wave ratio. Theantenna-plasma system is modelled as a lossy transmission line, and atransformer model is applied to study the electrical properties of the system.The model is used to evaluate the conditions required to launch a travellingwave, and these conditions are verified experimentally. The plasma densitydistributions under various operating conditions are measured with Langmuirprobes and compared to a global model for inductive discharges. Ourexperiments show that high plasma densities are produced over a large area,and that the density profiles are strongly influenced by the antennaconfiguration and standing-wave effects.
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