Abstract
A simple and low-cost methodology to fabricate micro/nanostructure anti-refraction coatings (ARCs) of solar cells is introduced. The nanostructure ARCs are generated by O2 Plasma surface modification technique for a flexible polydimethylsiloxane (PDMS) polymeric film, the microstructure ARCs are obtained by soft imprint lithography, and the micro-nano complex structure PDMS ARCs are fabricated by soft imprint lithography technique combined with surface modification technique. The measured results show that these PDMS ARCs can decrease reflection loss of light from the solar cells and increase the solar cells photovoltaic conversion efficiency.
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