Abstract
Abstract The equipment for metal ion beam enhanced deposition is introduced. This is composed of an all-element gas-solid ion source and low energy ion sputtering source, and thus can be used for simple gas ion or metal ion implantation, simultaneous implantation of gas and metal ions, as well as gas ion or (and) metal ion beam enhanced deposition. The process of metal ion beam enhanced deposition and multi-ion beam enhanced deposition was investigated. As an example of optical films, pure Ag films and Al films were prepared by metal ion beam enhanced deposition. The results show that the adhesion of the films to substrates is high and there is a mixed interface between the films and substrates. As an example of corrosion resistant films, (Ti, Mo)N films were prepared on YG8 hard alloy by multi-ion beam enhanced deposition. The corrosion resistance of the (Ti, Mo)N film is much higher than that of TiN film and the YG8 hard alloy substrate.
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