Abstract
Spectroscopic ellipsometry (SE) with its fast, precise, non-destructive and non-contact nature, working both ex situ and in situ, is the ideal characterization tool for thin films in terms of optical, struactural and electrical information obtained over wide application domains. The review aims to prove the versatility of such a powerful technique, starting with the basic knowledge of the ellipsometry, extending the application field from UV–vis-NIR to VUV and IR domains, and then advancing to the analyses of porosity, anisotropy, surface mapping and bowing parameter. The examples shown in this review illustrate the complementarity of ellipsometry with other characterization techniques, highlighting the sensitivity and the quality of the results especially in the domain of the sol–gel films.
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