Abstract
Poly(methylmethacrylate) (PMMA) with various molecular weights exposed using 50keV electron beam have been investigated at subzero developer temperatures. Contrast curves for Methyl Isobutyl Ketone (MIBK):Isopropyl Alcohol (IPA)=1:3 and MIBK:IPA=1:7 developers were determined. The contrast curves for different molecular weight PMMA resists converge into a single curve at lower temperatures. At low temperatures, the line edge roughness and resolution improved. However, minimum line pitch shows no significant improvement while dose latitudes for a particular line pitch increased. It is shown that at low temperatures, linewidth resolution and periodicity are invariant for the different PMMA molecular weights (50K to 2.2M) used in this work.
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