Abstract
ABSTRACTThe influence of the growth conditions on the composition, microstructure, and mechanical properties of TiN formed with low energy Ar+ ion bombardment during reactive physical vapor deposition was studied. The ratios of the incident ion and atom fluxes at the growth surface were varied systematically and were found to have a strong influence on both the composition and the microstructure of the films. These changes correlated well with measured changes in mechanical and optical properties. The films were examined using Auger electron spectroscopy, transmission electron microscopy, and their mechanical properties were studied using hardness, friction, and wear testing.
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