Synthesis of Nanostructures Using Ion-Beams: An Overview

Abstract

The objective of this chapter is to give an overview on the basic principles underlying the synthesis of nanocomposite materials using ion-beams. In particular, those based on metallic nanoparticles embedded within a dielectric host matrix. However, this chapter is not meant as a complete literature survey and does not include all the immense existing literature. Instead, it can be taken as a practical handbook where the main ion-related strategies developed to synthesize nanocomposites are rationalized. These can be divided into two main categories: in the first one, the ion-beam is used to introduce a foreign species into a host matrix. This bottom-up approach is for example the domain of the ion-implantation. In the second one, the ion-beam is used to depose the energy into a host matrix already containing the foreign species. These can be in form of solute monomers, nanoparticles or thin films. This top-down approach is for example the domain of the ion-irradiation. Besides, the main limitations inherent to the ion-beam techniques are described and some alternative strategies are illustrated. Finally, it has recently been pointed out that the processes occurring during the ion beam synthesis are similar to those observed in driven alloys. Thus, this chapter is also an attempt to bridge the gap between the experimental and theoretical works developed so far in both the fields of driven alloys and metal-glass nanocomposites submitted to ion irradiation.