Synthesis of diamond particles with an acetylene fired circulating fluidized bed

Diamond films are deposited on an aluminum substrate under a constant high discharge current (Id=700 mA) and a methane concentration of about 2% by DC plasma CVD, and their structural characteristics resulting from the difference in substrate temperature (Ts: 140–480°C) are investigated. Many diamond particles with an average size of 0.3 µm and having a clear crystal habit are formed at Ts about 480°C. When Ts is decreased, the deposited films tend to contain hydrogenated amorphous components as well as amorphous carbon phases. The films deposited at extremely low Ts, such as 140°C, are composed of submicron grains like pebbles, in which nanocrystalline diamond crystals and amorphous phases having C–C and C–H bonds aggregate to form these submicron grains. It has been found that diamond films with different grain morphology are deposited on the Al substrate.

Surface coating by diamond particles on an aluminum substrate by underwater shock wave

Diamond deposition in low-pressure acetylene flames: in situ temperature and species concentration measurements by laser diagnostics and molecular beam mass spectrometry

Diamond chemical vapour deposition on seeded cemented tungsten carbide substrates

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Behaviour of Co binder phase during diamond deposition on WCCo substrate

Application of heat treatment and dispersive strengthening concept in interlayer deposition to enhance diamond film adherence

Diamond deposition on Mo with thermal stress buffer layer coated mild steel substrate by combustion flame CVD

To improve wear resistance of the atmospheric thermal plasma sprayed molybdenum coating, diamond deposition on the molybdenum plate and the atmospheric plasma sprayed molybdenum coating by the combustion flame chemical vapor deposition (CVD) was carried out. Diamond has excellent properties such as low surface energy, hardness, chemical corrosion resistance ability and so on. Besides, since the combustion flame CVD is the process carried out in the air, diamond/ molybdenum complex coating can be deposited without any vacuum facilities by using this technique if molybdenum coating is deposited by atmospheric thermal spray. In this study, acetylene welding torch was used as diamond synthesis apparatus and mass flow ratio C2H2/O2 was varied from 0.9 to 1.3. Consequently, many diamond particles which were 10 micrometer in diameter respectively were deposited on the molybdenum plate by only 20 minutes combustion flame irradiation in the case of 1.2 in mass flow ratio of C2H2/O2. Especially, the molybdenum coating was covered with diamond films consists of 10 micrometer diameter particles in the case of over 1373K in deposition temperature. Besides, according to the results of wear testing, wear mass loss of diamond deposited coatings were much lower than that of original thermal sprayed molybdenum coatings. From these results, this process was found to have a high potential in order to improve wear resistance of thermal sprayed coating.

Diamond‐on‐GaN heterostructure is a promising hybrid material system with a variety of applications such as heat spreaders, high‐temperature, and high‐power devices. From a practical point of view, polycrystalline diamond is shown to be an attractive solution to the limited use of the expensive monocrystalline diamond substrates. Here we present selective area diamond deposition on AlGaN/GaN layers focusing on the elimination of surface and metal contact damage (Ni, NiO, Ir, and IrO2) and suppressing the spontaneous nucleation of diamond. Metal contacts are important for further applications such as diamond‐coated GaN based electronic devices. The growth of diamond films was performed by microwave chemical vapor deposition in different gas mixtures with the addition of CO2 or N2 to CH4/H2. Adding CO2 resulted in polycrystalline (PCD), while adding N2 led to the formation of nanocrystalline diamond film (NCD). The diamond deposition was carried out using selective area nucleation in a three‐layer sandwich structure (polymer/seeding layer/polymer), which avoided damage to the electrode and GaN surfaces from ultrasonic seeding by diamond particles. No protective layer was used on the GaN surface before diamond deposition, i.e., diamond films were grown directly on the AlGaN/GaN heterostructures. In the case of NCD deposition, no surface damaging of GaN was observed. For both NCD and PCD films, increasing methane from 1% to 2% in H2 minimized the surface damage of GaN films.

Advanced deposition characteristics of kinetic sprayed bronze/diamond composite by tailoring feedstock properties

X-ray photoelectron spectroscopy (XPS) was performed in as-received, thermally annealed, and laser-irradiated sapphire and alumina specimens in order to study the effects of the different treatments on surface chemistry and properties. Laser irradiations with a 308 nm wavelength laser were performed in air and in a reducing atmosphere consisting of a mixture of Ar and 4% of hydrogen. The atomic percentages of carbon, aluminum, and oxygen were measured in all the specimens. Particular attention was paid to the percentages of oxygen in the oxide and in a hydroxyl state. The XPS analyses clearly established that a very thin film of metallic aluminum is formed on the surface of both alumina and sapphire substrates when they are irradiated under a reducing atmosphere. However, the film is discontinuous because it is electrically insulating. Substrates irradiated in air have metallic aluminum only for fluences below 0.4 J/cm2. The valence band photoemission spectra of as-received, annealed, and laser-irradiated specimens were measured. In irradiated specimens, the width of the valence band spectra was found to decrease by ∼10%. One possible cause of this decrease is the generation of point defects during laser irradiation. Electroless copper deposition occurs on sapphire and alumina substrates if their surface has been activated by laser irradiation. The time required for copper deposition was monitored by measuring the electrical resistivity in the irradiated area while the substrates were immersed in an electroless bath. The kinetics of deposition on laser-activated substrates and the XPS results show that the presence of metallic aluminum accelerates the deposition process. However, the presence of aluminum is not the sole reason for laser activation in alumina. Very strong metal-ceramic bonding is produced after thermal annealing of samples having preirradiated substrates. This result is explained in terms of the excess oxygen that is present at the ceramic surface after irradiation.

Heterogeneous chemical effects in the deposition of CVD diamond

Nanocrystalline nickel was deposited on annealed copper substrate of unit surface area (1 cm2) via pulsed electrodeposition technique using potentiostat (model 263A, Princeton Applied Research, USA) from Watts bath containing nickel sulfate, nickel chloride ,boric acid and sodium citrate. Diamond particles of three different dimensions, viz., 1, 3, and 6 micron were added separately (5 g/L) to the watts bath and co-deposited along with nanocrystalline nickel. The temperature was kept constant at 55 °C. The solution was ultrasonicated for 45–60 minutes prior to deposition to disperse the diamond particles uniformly in the bath. Depositions were carried out at different current densities, viz., 50, 100,150 and 200 mA/ cm2 for different durations, i.e.7, 14 and 21 minutes and best results are optimized for 200mA/cm2 so it is used for all process here .Scanning electron micrographs (SEM) show uniform deposition of microstructure of micron diamond on the surface of copper embedded in the nickel matrix. Elemental mapping confirmed uniform deposition of nickel and diamond with almost no cracks or pits. Mechanical properties of the sample such as, Vicker’s hardness increased abruptly after the electrodeposition. Improved microstructural and mechanical properties were found in the case of electrodeposited surfaces containing followed by 3 and 6 micron diamond. The properties were also found better than those processed via stirring the solution during deposition.

Electroplating technology of suspended diamond particles surface based on rotating electrode