Abstract
Ir(TFA) 3 (TFA=1,1,1-trifluoro-2,4-pentanedionate) metal complexes with high purity was successfully synthesized. The metal complexes have been characterized by elemental analysis, infrared spectroscopy, nuclear magnetic resonance spectroscopy. The volatility of metal complexes was studied by thermogravimetry analysis. And a possible decomposition mechanism was studied by mass spectroscopic analysis method. The novel iridium complexes can be severed as precursor in metalorganic chemical vapor deposition of iridium films. iridium films were deposited by metalorganic chemical vapor deposition method, and the Ir(TFA) 3 complex was used as precursor. The iridium thin films were characterized by X-ray diffraction and scanning electron microscopy in order to determine crystallinity and surface morphology.
Highlights
Noble metal thin films have been extensively studied by both the traditional and microelectronics industries for potential applications such as anti-corrosion and antioxidation coating [1,2], or in the manufacture of bottom electrodes for high-density memory devices and ferroelectric capacitors [3,4,5]
The results showed the Ir(TFA)3 was synthesized successfully with high purity
The results concluded from 1H-NMR spectrum confirm that the prepared Ir(TFA)3 is of high purity, in agreement with elemental analysis
Summary
Noble metal thin films have been extensively studied by both the traditional and microelectronics industries for potential applications such as anti-corrosion and antioxidation coating [1,2], or in the manufacture of bottom electrodes for high-density memory devices and ferroelectric capacitors [3,4,5]. The ligand dissolved in a 2M NH3.H2O aqueous solution was dropped continuously to the IrCl3 in ethanol solution, followed by the addition. Nuclear magnetic resonance (1H-NMR) spectrum was obtained using an INOVA 400 spectrometer for sample dissolved in CDCl3. In order to obtain more explicit and idiographic about decomposition mechanism of the metal complex, a mass spectrometer (model HP 5989B) was used to obtain the cracking patterns of Ir(TFA). The sample was ionized by the electron impact (EI) method and the scanned mass range was from 1 to 800m/z
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