Abstract
Hybrid (III–V)–(IV) alloys described using the general formula (GaP)y(Si)5–2y have been synthesized as epitaxial layers on Si(100) using specially designed chemical vapor deposition methods. Reactions of [D2GaN(CH3)2]2 with P(SiH3)3 between 525 and 540 °C gave GaPSi3 (y = 1) with a fixed Si content of 60%, while analogous reactions of [H2GaN(CH3)2]2 at >590 °C produced Si-rich derivatives with tunable Si contents in the range of 75–95% (y < 1). In both cases, diffraction studies and optical characterizations demonstrate single-phase, monocrystalline structures with an average diamond cubic lattice akin to Si. Raman scattering supports the presence of a tetrahedral structure containing isolated Ga–P pairs randomly embedded within the parent Si matrix. This outcome is consistent with theoretical simulations of a crystal growth mechanism involving interlinking GaPSi3 tetrahedra in a manner that precludes the formation of energetically unfavorable Ga–Ga bonds. Ellipsometry measurements of the dielectric funct...
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