Abstract
Schiff base is a diverse group of organic compounds and has potential as a UV absorber for ink systems due to its high UV protection, simple synthesis, and high dispersion in organic matrices. In this work, a novel Schiff base α-(4-(2,3-dihydroxylpropoxy)phenylimino)-o-cresol (named GMA-I) was synthesized and investigated as a UV absorber for ink system. The UV-protection of GMA-I was evaluated on ink-coated duplex substrate samples via color measurement using an accelerated UV test chamber. The results showed that the GMA-I exhibited strong absorption in both UVA and UVB regions with an extra high molar absorption coefficient of 43,554 M−1 cm−1, and high thermal stability of 271.4 °C. Interestingly, the GMA-I showed high UV protection for ink platform at low content of 2 wt% thank to the intramolecular proton transfer mechanism and therefore potential as a UV absorber additive for ink systems.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Photochemistry & Photobiology, A: Chemistry
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
