Abstract

I-V characterization of the bulk and amorphous thin film of the as-prepared Si <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">15</inf> Te <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">80</inf> Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</inf> sample is carried out to better perceive the electrical switching behavior. Memory and threshold switching have been discerned in bulk glass, but only memory switching has been shown by amorphous thin films. The thin film device exhibits a substantially lower threshold voltage than its bulk version, suggesting that it could be used for phase change memory (PCM). The glass is subjected to Set –Reset using a triangle pulse of 6 mA for set operation and a rectangle pulse of 12 mA for reset operation to determine the suitability of the provided glass for PCM use. A constant recurrence of a few Set-Resets is evident in this study. Morphological study has also been carried out on the bulk sample.

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