Abstract

Presented here is an examination of unstructured and structured (by anisotropic etching), monocrystalline silicon wafers coated with sputter deposited aluminum and chemical vapor deposited silicon dioxide for high solar reflectance and high thermal emittance, respectively. The topography of the samples was characterized with optical and scanning electron microscopy. Optical properties were examined with reflectance and transmittance spectroscopy, partly by usage of an integrating sphere. The measurement results were used to estimate the equilibrium temperature of the surfaces in space. The suitability of the surfaces with high solar reflectance and high thermal emittance to aid in the thermal control of miniaturized, highly integrated components for space applications is discussed. A silicon dioxide layer on a metal layer results in a slightly lower reflectance when compared to surfaces with only a metal layer, but might be beneficial for miniaturized space components and modules that have to dissipate internally generated heat into open space. Additionally, it is an advantage to microstructure the emitting surface for enhanced radiation of excess heat.

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