Abstract
The adsorption and pyrolysis of tetrakis-(dimethylamido)-titanium (TDMAT), Ti[NMe2]4, on several metal substrates, were studied using x-ray photoelectron spectroscopy, Auger electron spectroscopy, infrared reflection absorption spectroscopy and thermal desorption mass spectrometry. TDMAT was found to decompose readily above ∼480 K on metallic substrates, producing TiCxNy films exhibiting a carbon-rich interface. However, in the presence of NH3, well below the threshold of gas-phase reactions (<10−4 Torr), the growth of low-carbon-content (≤8 at. %) titanium nitride films proceeds readily, via surface mediated reaction(s) of TDMAT and NH3 between 550 and 750 K. The effects of surface temperature and reagent pressures are reported and discussed.
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