Abstract
We report the investigation of morphology and composition of copper nanocluster films deposited on Si substrates. The nanoclusters are formed in an aggregation tube at room temperature and magnetron sputtering source is used to get negatively charged Cu-clusters' beam which is subsequently mass-filtered to get size-selected cluster on the substrates as soft-landing process of deposition. For composition of the films, X-ray photoelectron spectroscopy (XPS) technique is used. For morphological changes of the films both scanning electron microscopy (SEM) and atomic force microscopy (AFM) analyses are carried out. Additionally, Energy Dispersive X-ray (EDX) spectra support the compositional and structural informations of the film. The analysis of Cu nanoclusters' films reveals that initial nucleation of Cu clusters takes place in the form of isolated islands and the arrival of subsequent Cu clusters onto Si substrates has preferential aggregation around the preceding clusters forming a mound structure.
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