Abstract

Plasma deposition of a thin top layer with tailored properties is an effective strategy of modification of the organic coating surface. Thin plasma polymer layers are candidates and can provide superior hardness, scratch resistance, modified surface hydrophobicity and easy to clean properties. The present work studies the stability of thin plasma polymer films deposited as top layer on polyurethane coil coating systems. Microwave, hollow cathode and radio frequency plasma polymerization reactors were employed in order to deposit a thin SiO x based plasma polymer layer. The plasma film stability was studied using surface analysis techniques, ex situ and in situ atomic force microscopy and scanning electron microscopy. Energy dispersive spectroscopy, FTIR spectroscopy and optical measurements confirm the composition and plasma layer properties. The structure of the plasma layers was investigated by means of transmission electron microscopy. The surface morphology together with composition evolution allows the study of the stability of the different coatings. The structure examination of the formed plasma polymer film offers good clarification for coating failure. Decrease of the operating pressure during plasma polymerization and oxygen concentration in precursor mixture lead to formation of compacter layer with higher stability. Introduction of fluorine-containing precursor also increases the anti-weathering performance of the plasma polymer films.

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