Abstract
Abstract Atomic layer deposition (ALD) was employed to obtain superior deposition of a conformal ZnO shell on SiO2 spherical particles passivating the limitations of wet-chemical deposition routes which yield inferior surface-related physicochemical characteristics of resultant SiO2-ZnO particles. It was established that ALD route for deposition of ZnO on SiO2 enables us to have reasonably crystalline ZnO shell over amorphous SiO2 (SZCSPs), without any evolution of corresponding silicates of zinc that may lower the performance of SZCSPs. Detailed scanning and transmission electron microscopy along with X-ray diffraction analysis were utilized to elucidate the morphological contrast of SZCSPs particles, concomitantly revealing the structural superiority, conformality and effectiveness of ALD deposition in comparison with the wet-chemical route. Concurrently, improved optoelectronic properties were recorded for superior photocatalytic performance of the SZCSPs under UV-irradiation for degradation of rhodamine-B dye. Furthermore, the dye degradation performance was investigated by scavenging experiment, revealing the mechanism of generation of reactive species and their interaction with rhodamine-B dye molecules.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Physica E: Low-dimensional Systems and Nanostructures
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
