Abstract
Supercritical fluid deposition (SCFD), which utilizes the oxidation/reduction of organic compounds in supercritical CO 2 (scCO 2 ), is a promising thin film process for the fabrication of 3-dimenotional (3D) structure due to its conformal deposition capability on high aspect ratio features with moderate growth rate. In this work, SCFD was used to fabricate a conformally-stacked RuO 2 /TiO 2 /RuO 2 structure as an MIM capacitor.
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