Abstract
In this paper we discuss results of research related to design of successive ionic layer deposition (SILD) technology for both preparing porous nano-structured SnO2 films, and surface modification of SnO2 films deposited by spray pyrolysis. This new method of metal oxide deposition has exited high interest, because of this method simplicity, cheapness, and ability to deposit thin nano-structured films on rough surfaces. Method of successive ionic layer deposition (SILD) consists essentially of repeated successive treatments of the conductive or dielectric substrates by solutions of various salts, which form on the substrate surface poorly soluble compounds. It was shown that SILD technology is effective method for above mentioned purposes.
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