Abstract
We are investigating the feasibility of a recording medium in which each bit of information is stored in a single-domain magnetic particle. To this end we have developed a procedure for high-resolution patterning of magnetic recording films using direct write electron-beam lithography and a multistep sputter etching process. We have used this procedure to define small islands of polycrystalline magnetic thin film with feature sizes down to 0.1 μm. The patterning process is suitable for many different kinds of magnetic films, including single-crystal epitaxially grown films, and is designed to minimize physical and chemical damage to the magnetic material being patterned. Both atomic force microscopy and x-ray photoemission spectroscopy have been used to establish that the magnetic islands patterned using this process are physically isolated from each other.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
