Study the influence of deposition parameter on structure & wettability properties of chromium oxide coating deposited by reactive RF magnetron sputtering on GFRP composite

Abstract

Chromium Oxide thin layer were deposited on Glass fibre reinforcement Plastic(GFRP)composite substrates by Reactive RF Magnetron Sputtering. The influence of deposition parameters namely, deposition Temperature and Gas Flow Rate (Ar:O2) on chromium oxide thin films are examined. Crystal structure of sample and plane orientation was determined by X-Ray Diffraction. Temperature variations leads most stable peaks of Crystalline structure at 2θ = 22°. Wettability studies of water on GFRP composite are hardly ever done. In the present research study, contact angle of water on deposited Cr3O4 thin films was determined by Ramehart Goniometer. The deposited Cr3O4 film possessed hydrophobic nature with rise in deposition temperature and Gas Flow Rate. Highest contact angle carried out at 300 °C and Ar:O2 = 8:12 Standard cubic centimetres per minute (SCCM) in both the case which is equal to 98.9° .Moreover, Surface Roughness Tester was used to find the surface roughness of Cr3O4 Nanostructured films, which revealed that surface roughness increase with increase in the deposition temperature and Gas Flow Rate. Maximum Surface Roughness achieved at Ar:O2 = 8:12 Standard cubic centimetres per minute SCCM and 300 °C temperature which is 0.80 nm. The primary inspiration of the scientific exploration is to broaden the horizon of knowledge regarding the wettability of Cr3O4 thin films, which has wide range application in different industries.